Exploration 1C:
How is Chemistry used
to build ICs?: Using Photolithography
Photolithography is the process of using light
to create a pattern. For integrated circuits, photolithography
is used to remove areas of a protective layer so that chemical
reactions can take place on the exposed areas.
Click through the movie
on the left to see the photolithography process illustrated. You
may click on a text link below for an explanation of that step.
Process Steps for Photolithography
Clicking on the text
links will take you to the Glossary for more information about
the term.
- Begin with Doped
Silicon Substrate
- Grow Oxide
Layer
- Apply Photoresist
Polymer
- Place Mask
over Chip
- Expose Areas to be
Removed to Light
- Remove Mask
- Wash
Away Exposed
Photoresist
- Etch
Oxide Layer
- Deposit Next
Layer
- Remove Remaining
Photoresist
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The wafer is now ready
for an insulating layer either to protect the components from
outside elements or to provide a barrier between the components
and subsequent layers of connectors (wires).
Glossary
- Doped Silicon Substrate
-
- Silicon's conductivity
for the capacitor substrate is enhanced by "doping"
or inserting other atoms into the crystal matrix. In p-doped
silicon, atoms such as boron with 3 valence electrons are inserted
into the crystal. The "p" designation comes from the
holes (or missing electrons) resulting from having atoms present
with 3 valence electrons instead of silicon's four valence electrons.
In n-doped silicon, atoms with five valence electrons,
such as phosphorus, are added resulting in extra electrons present
relative to when all the atoms were silicon. Back
- Oxide Layer
-
- The most common insulator
used in microelectronics is silicon dioxide glass. Silicon dioxide
is a very poor conductor. Back
- Photoresist Polymer
-
- The photoresist polymer
is the heart of photolithography in integrated circuit production.
It is a very thin coating of polymer applied to the wafer surface
which will react with light to create areas which are soluble
in different solvents. By removing selected areas of the photoresist,
areas of the wafer are made available for reactions and modifications
while the rest of the wafer is protected. Back
- Mask
-
- The mask is a very
elaborate template which shields the areas of the photoresist
that are needed for protection and allows light to penetrate
to the photoresist to be removed. Back
- Light
-
- The light used to
initiate transformations in the photoresist polymer is usually
ultraviolet light. For the type of photoresist polymer illustrated
here, the light initiates bond-breaking so that the exposed areas
can be easily washed away. Back
- Washing Considerations
-
- What do you think
needs to be considered in the washing step? Yes, the chemical
properties of the exposed and unexposed photoresist have to be
considered when choosing a solvent to selectively remove the
exposed photoresist.
Back
- Etching the Oxide Layer
-
- The chemical reaction
used to remove the oxide layer will not affect either the photoresist
above nor the silicon layer below. The principles of thermodynamics
often enable chemists to predict a reaction's selectivity.
Back
- Additional Layers
-
- The next layer in
microelectronics would generally be some sort of conducting or
semiconducting material. This could be a conducting metal such
as aluminum or a layer of polycrystalline silicon to be used
as transistor gates. Back
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